CR Mirco launches photomask production project

A groundbreaking ceremony for China Resources Microelectronics's DIS high-end mask project is held in Wuxi National Hi-tech District on Nov 22. [Photo/Wuxi Daily]

A groundbreaking ceremony for China Resources Microelectronics's DIS high-end mask project was held in Wuxi National Hi-tech District on Nov 22.

Wuxi DIS Microelectronics Co Ltd is a key enterprise under China Resources Microelectronics, focusing on photomask manufacturing. It is an influential photomask company with an independent brand in China.

A design sketch of China Resources Microelectronics's DIS high-end mask project. [Photo/Wuxi Daily]

With an investment of about 1.3 billion yuan ($182 million), the project will build a 40-nanometer advanced photomask production line to help companies further improve their mask manufacturing capabilities and improve both their production capacity and technical level.

Meanwhile, it is expected to fill the gap in the domestic high-end mask foundry field and inject new momentum into Wuxi's move to build a leading integrated circuit industry.